SPTS Technologies
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CVE
The CVE module has a unique chamber design which provides high etch rates, uniformity and efficiency..
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e2
Built for simplicity, low cost of ownership and a small footprint, the Xactix® e2TM is the..
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ICP Etch
The Omega® ICP process module uses a patented high density plasma source incorporating a radial coil..
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Metal Deposition
Sigma® Deposition SystemsThe Sigma product range supports wafer sizes from 100mm to 300mm with depos..
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Monarch 25
The Monarch25 25-wafer batch process module is designed for medium to high volume HF release etch pr..
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Monarch 3
This compact module includes a three-wafer process chamber, and is designed for resea..
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Mosaic™ System
The Mosaic™ platform with Rapier-S process modules, is an etch system, designed for plasma dicing of..
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MVD100E
The MVD100E is the designated tool for R&D or pilot manufacturing. It is designed for high perfo..
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MVD300 / MVD300E
The MVD300 (and MVD300E with an EFEM) are designed for high performance, flexibility ..
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MVD4500
The MVD4500 is our panel and large substrate tool. It is capable of handling multiple substrates wit..
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Si DRIE
With an installed base of over 1000 DRIE process modules, SPTS’ market-leading position is spearhead..
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Synapse Dielectric Etch
SPTS’ Omega® Synapse process module is an ICP-based high density plasma source, designed to etch mat..
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uEtch
The uEtch is a single-wafer system specifically designed for university and small research laborator..
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